Advances in Imaging and Electron Physics, 106

  • Benjamin Kazan, Xerox Corporation, Palo Alto, California, U.S.A.
    • Tom Mulvey, Aston University, Department of Electronic Engineering and Applied Physics, U.K.
      • Peter Hawkes, CEMES/Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique, Toulouse, France


      Researchers in electrical engineering, optical science and technology, materials science, image processing, and mechanical engineering.


Book information

  • Published: February 1999
  • ISBN: 978-0-12-014748-9


"Editing by P.W. Hawkes is immaculate and the production, in the usual style of Advances in Electronics & Electron Physics, results in a volume that will be a handsome addition to any bookshelf."
Praise for the Series, --MRS BULLETIN

"With the accelerating pace of research and development in so many areas of microscopy, keeping abreast of the widespread literature is becoming increasingly time-consuming. In Advances in Optical & Electron Microscopy the Editors are to be congratulated on bringing together in a convenient and comprehensible form a variety of topics of current interest."

Table of Contents

M.J. Deen, T.D. Hardy, and R. Murowinski, Effects of Radiation Damage on Scientific Charge Coupled Devices. C.M. Krowne, CAD Using Green's Functions and Finite Elements and Comparison to Experimental Structures for Inhomogeneous Microstrip Circulators. S. Marchard-Maillet and S. Antipolis, Discrete Geometry to Image Processing. H. Ozaktas, M.A. Kutay, and D. Mendlovi, Introduction to the Fractional Fourier Transform and Its Applications. E.H.K. Stelzer and F.M. Haar, Confocal Microscopy. Subject Index.